Breaking the Technology Black Box: Shanghai AI Lab Overcomes the Challenge of Preparing Photoresist for Chip Manufacturing
The Shanghai Artificial Intelligence Laboratory has successfully solved the challenge of stable preparation of high-end KrF photoresist resin by combining the "Shueng" scientific large model and automation platform with multiple research institutions. This marks a major breakthrough in the core material field of chip manufacturing. The technology breaks the traditional trial-and-error approach, significantly improving R&D efficiency. Key indicators of related industries have met expectations.
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